中文简介

等离子体源科学和技术报告在所有压力和密度范围内运行的非聚变等离子体源，包括中性和非中性等离子体源；正负离子源；自由基源；微波、射频、直流电、激光和电子束激发源；共振源；蚀刻、沉积、聚合、烧结用等离子体；加速器用等离子体源；照明应用；医学物理用等离子体源；激光用等离子体源；其他应用，如航天器推进器；工业电弧熔化；低压等离子体源：分布函数；激辐射平衡；振动激励；质量、动量和能量传输；离子注入。中低压等离子体源：等离子体表面相互作用；高压源；热等离子体；等离子体诊断技术；等离子体和等离子体源建模。

英文简介

Plasma Sources Science and Technology reports on non-fusion plasma sources which operate at all ranges of pressure and density including neutral and non-neutral plasma sources; positive and negative ion sources; free radical sources; microwave, RF, direct current, laser and electron beam excited sources; resonant sources; plasmas for etching, deposition, polymerization, sintering; plasma sources for accelerators; lighting applications; plasma sources for medical physics; plasma sources for lasers; other applications, e.g. spacecraft thrusters; industrial arc melting; plasmas as sources of UV and x-ray radiation; plasma source design, monitoring and control; source stability and reproducibility. Low-pressure plasma sources: distribution functions; excitation-radiation equilibria; vibrational excitation; mass, momentum and energy transport; ion implantation. Low-to-medium pressure plasma sources: plasma surface interactions; high pressure sources; thermal plasmas; plasma diagnostic techniques; plasma and plasma source modelling.